high k metal gate process flow
由LWu著作·2013—OnestepfromtypicalCMOSprocessflowisthesource/drain(S/D)activationannealing,whichthegatestackmustundergo.ThetypicalS/D ...,由JRobertson著作·2015·被引用734次—...gatelast'processflow,inadditiontothestandard'gatefirst'approach.Workfunc...
High‐κmetal gate for advanced transistor applications | DR
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由TDuan著作·2015—Figure4.1(a)ProcessflowforthefabricationXPSsamplesaswellascapacitorsand(b)schematicdiagramsofthegatestacksforXPSsamples ...
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